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System for Plasma-enhanced Chemical Vapor Deposition (pecvd)

NetherlandsTenders notice for System for Plasma-enhanced Chemical Vapor Deposition (pecvd). The reference ID of the tender is 84247829 and it is closing on 25 Jul 2023.

Tender Details

  • Country: Netherlands
  • Summary: System for Plasma-enhanced Chemical Vapor Deposition (pecvd)
  • NLT Ref No: 84247829
  • Deadline: 25 Jul 2023
  • Financier: Self Financed
  • Purchaser Ownership: Government
  • Tender Value: Refer Document
  • Notice Type: Tender
  • Document Ref. No.: EBOUT 5934
  • Purchaser's Detail:
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  • Description:
  • The MESA+ Institute will invest in a two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their stateoftheart thin film technology and processing capacity. Applications Lowtemperature deposition of pinholefree, low stress, conformal thin films. Moderatetemperature deposition of low stress thin films.
  • Documents:

 Tender Notice

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System for Plasma-enhanced Chemical Vapor Deposition (pecvd) - Netherlands Tender

The UNIVERSITY OF TWENTE, a Government sector organization in Netherlands, has announced a new tender for System for Plasma-enhanced Chemical Vapor Deposition (pecvd). This tender is published on NetherlandsTenders under NLT Ref No: 84247829 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2023-07-25.

The estimated tender value is Refer Document, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.

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