- Country: Netherlands
- Summary: European Tender Two Parallel Plate Plasma-Enhanced Chemical Vapor Deposition (Pecvd) Systems
- NLT Ref No: 117738698
- Deadline: 26 May 2025
- Financier: Self Financed
- Purchaser Ownership: Government
- Tender Value: EUR 800000
- Notice Type: Tender
- Document Ref. No.: 248600-2025
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- Description:
- The University of Twente is tendering to purchase two new Plasma-Enhanced Chemical Vapor Deposition systems. The MESA+ Institute will invest in two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their state-of-the-art thin film technology and processing capacity. The systems will be used for moderate-temperature deposition of low stress thin films. For the following materials: silicon dioxide (SiO2) boron-doped SiO2 (BSG) phosphorus-doped SiO2 (PSG) boron-phosphorus-doped SiO2 (BPSG) low-stress silicon nitride (SiNx) silicon oxynitride (SiOxNy) amorphous silicon (aSi)
Doc Title: European Tender Two Parallel Plate Plasma-enhanced Chemical Vapor Deposition (PECVD) Systems
Contract Type: supplies - Documents:
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CLICK HERE TO LOGINEuropean Tender Two Parallel Plate Plasma-Enhanced Chemical Vapor Deposition (Pecvd) Systems - Netherlands Tender
The UNIVERSITEIT TWENTE, a Government sector organization in Netherlands, has announced a new tender for European Tender Two Parallel Plate Plasma-Enhanced Chemical Vapor Deposition (Pecvd) Systems. This tender is published on NetherlandsTenders under NLT Ref No: 117738698 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2025-05-26.
The estimated tender value is EUR 800000, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.
